CENTRAL GLASS & CERAMIC RESEARCH INSTITUTE
KNOWLEDGE RESOURCE CENTRE
KOLKATA
CSIR - Central Glass and Ceramic Research Institute (CGCRI)
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Huttinger, K. J
The effect of oxygen traces on the nitriding of high-purity silicon between 1250 and 1380 degree - , 1970
The effect of oxygen traces on the nitriding of high-purity silicon between 1250 and 1380 degree - , 1970
Developed Under CSIR-KNOWGATE Project (12th Five Year Plan Network Project)
Designed by :
Mrs Ruma Chackraborty,Technical Officer and Sk Nausad Kabir, Project Assistant
Supervised by :
Mrs Chandana Patra, Principal Technical Officer