CENTRAL GLASS & CERAMIC RESEARCH INSTITUTE
KNOWLEDGE RESOURCE CENTRE
KOLKATA
CSIR - Central Glass and Ceramic Research Institute (CGCRI)
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Koenings, J. and others
Deposition of SiO2 with low impurity content by oxidation of SiCl4 in a nonisothermal plasma - , 1975
Deposition of SiO2 with low impurity content by oxidation of SiCl4 in a nonisothermal plasma - , 1975
Developed Under CSIR-KNOWGATE Project (12th Five Year Plan Network Project)
Designed by :
Mrs Ruma Chackraborty,Technical Officer and Sk Nausad Kabir, Project Assistant
Supervised by :
Mrs Chandana Patra, Principal Technical Officer