Fundamentals of silicon integrated device technology

by Burger,R M,ed.

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BookPublisher: Prentice-Hall New Jersey 1967Description: v.1: Oxidation, diffusion and epitaxy.Online resources: http://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=5212

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Item type	Location	Call number	Status	Date due	Barcode
Books	CGCRI	666.1:546.28 B954 (Browse shelf)	Available		18472

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Previous	666.3 W746 Ceramics clay technology	666.11.01 :539.213.1 B281 The structure and mechanical properties of inorganic glasses	541.1 S849 Recent advances in physical and inorganic chemistry	666.1:546.28 B954 Fundamentals of silicon integrated device technology	535-1:535.853:541 H153 Infrared spectroscopy in surface chemistry	66.011 T125 Fundamentals of process equipment design	Next

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Developed Under CSIR-KNOWGATE Project (12th Five Year Plan Network Project)
Designed by :
Mrs Ruma Chackraborty,Technical Officer and Sk Nausad Kabir, Project Assistant
Supervised by :
Mrs Chandana Patra, Principal Technical Officer

CENTRAL GLASS & CERAMIC RESEARCH INSTITUTE

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KOLKATA

CSIR - Central Glass and Ceramic Research Institute (CGCRI)

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Fundamentals of silicon integrated device technology

by Burger,R M,ed.

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CENTRAL GLASS & CERAMIC RESEARCH INSTITUTE

KNOWLEDGE RESOURCE CENTREKOLKATA

CSIR - Central Glass and Ceramic Research Institute (CGCRI)

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Fundamentals of silicon integrated device technology

by Burger,R M,ed.

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KNOWLEDGE RESOURCE CENTRE
KOLKATA