TY  - BOOK
AU  - DeForest, W. S
TI  - Photoresist: materials and processes
SN  - 0-07-016230-1
PY  - 1975///
CY  - McGraw-Hill
PB  - New York
UR  - http://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=8693
ER  -