000 00876nam a2200253Ia 4500
003 CGCRI
005 20151027130331.0
008 140225s2014 xx 000 0 eng d
020 _a0-87170-692-X
040 _cCGCRI
_bENG
_aCGCRI
041 _hENG
080 _a621.793.3
_bCHE/ACSIR
100 _aPark, Jong-Hee, ed.
_91250
245 _aChemical vapor deposition
_ced. by Jong-Hee Park and T.S. Sudarshan
260 _aASM International
_bOhio
_c2001
300 _avii, 481p.
500 _aSurface engineering series; v.2
650 _aChemical vapor deposition
_91252
650 _aVapor-plating
_91253
650 _aRefractory coating
_91254
710 _aSundarshan,T. S., ed.
_91251
856 _uhttp://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=11725
_yhttp://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=11725
942 _cBK
_2udc
999 _c11725
_d11725