| 000 | 00403nam a2200169Ia 4500 | ||
|---|---|---|---|
| 003 | CGCRI | ||
| 005 | 20140812102827.0 | ||
| 008 | 140225s2014 xx 000 0 eng d | ||
| 020 | _a0-07-016230-1 | ||
| 040 |
_cCGCRI _bENG |
||
| 041 | _hENG | ||
| 100 | _aDeForest, W. S | ||
| 245 | _aPhotoresist: materials and processes | ||
| 260 |
_aMcGraw-Hill _bNew York _c1975 |
||
| 300 | _axi, 269p. | ||
| 942 | _cBK | ||
| 999 |
_c8693 _d8693 |
||
| 856 |
_uhttp://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=8693 _yhttp://14.139.222.13:80/cgi-bin/koha/opac-detail.pl?biblionumber=8693 |
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